Programs > Brochure
URI Fashion Study Tour: New York City
New York City, United States (Outgoing Program)
URI Fashion Study Tour - NYCThis program is a 5-day exploration of the fashion capital, the New York City. Students visit upscale fashion retailers like Dover Street Market, as well as important apparel designers, merchandisers, sourcing houses, trend forecasting company and the FIT and MET museums. Finally, the itinerary also includes a networking event, aka alumni meet, giving students opportunity to interact with the current industry experts.
ACADEMICSStudents will earn 1 URI credits for TMD 342: Fashion Study Tour.
Course work will be supplemented with visits to fashion business houses and showrooms, specializing in various segments of the fashion supply chain, as well as museums.
A sample syllabus can be found here: TMD 342 - NYC Tour Spring 2019.pdf
ACCOMMODATIONSStudents will stay in double-occupancy rooms while on the program. Breakfast, lunch and dinner will be provided.
PROGRAM COSTProgram Fee: $1285
Program fee includes:
- Transportation to (and in) NYC
- Excursions and cultural activities
AIRFARE IS NOT INCLUDED
Saheli Goswami(401) 874-9294 - firstname.lastname@example.org
Saheli completed a Ph.D. in human environmental sciences with an emphasis on Textile and Apparel Management (TAM) in 2017 from University of Missouri (MU). She also completed two graduate certificates in Center for Digital Globe and in Organizational Change from MU in 2017. Before returning to academia, she worked for three years as a Merchandiser in the leather and apparel industry in India for clients such as Li & Fung, Next, House of Fraser, and Marks & Spencer.
(401) 874-2882 - email@example.com
Susan teaches in the technical aspects of apparel design, including TMD 222 Apparel Production, TMD 335 Apparel II (Flat Pattern Making Techniques), TMD 355 Draping for Apparel, and TMD 345 CAD Apparel Design. Under her direction, URI’s apparel studio has had major upgrades. In 2006 Susan was awarded a $130k Champlin Foundation Grant for an industry standard CAD system for apparel design and manufacture. In 2010, the same foundation provided $82k for an inkjet fabric printing system.
Susan was named the 2011 “Apparel All-Star” by the International Textile and Apparel Association. The award recognizes outstanding contributions in teaching/curricular development, research, and service activities in the textile and apparel field.
|Dates / Deadlines:|
Copyright © 2015 University of Rhode Island.